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Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/4790

Title: Unification of bulk and interface electroresistive switching in oxide systems
Authors: Ruotolo, Antonio
Leung, C. W.
Lam, C. Y.
Cheng, Wang-fai
Wong, Kin-hung
Subjects: Dielectric hysteresis
Ferroelectric switching
Impact ionisation
Lanthanum compounds
Negative resistance
Permittivity
Schottky barriers
Strontium compounds
Titanium compounds
Issue Date: 15-Jun-2008
Publisher: American Physical Society
Citation: Physical review B, condensed matter and materials physics, 15 June 2008, v. 77, no. 23, 233103, p. 1-4.
Abstract: We demonstrate that the physical mechanism behind electroresistive switching in oxide Schottky systems is electroformation, as in insulating oxides. Negative resistance shown by the hysteretic current-voltage curves proves that impact ionization is at the origin of the switching. Analyses of the capacitance-voltage and conductance-voltage curves through a simple model show that an atomic rearrangement is involved in the process. Switching in these systems is a bulk effect, not strictly confined at the interface but at the charge space region.
Description: DOI: 10.1103/PhysRevB.77.233103
Rights: Physical Review B © 2008 The American Physical Society. The Journal's web site is located at http://prb.aps.org/
Type: Journal/Magazine Article
URI: http://hdl.handle.net/10397/4790
ISSN: 1098-0121 (print)
1550-235X (online)
Appears in Collections:AP Journal/Magazine Articles
MRC Journal/Magazine Articles

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