Please use this identifier to cite or link to this item:
Title: Dielectric relaxation in polyimide nanofoamed films with low dielectric constant
Authors: Zhang, Yihe
Ke, Shanming
Huang, Haitao
Zhao, Lihang
Yu, Li
Chan, Helen L. W.
Subjects: Dielectric losses
Dielectric relaxation
Dielectric thin films
Glass transition
Nanostructured materials
Polymer films
Polymer foams
Issue Date: 8-Feb-2008
Publisher: American Institute of Physics
Source: Applied physics letters, 8 May 2008, v. 92, 052910, p. 1-3
Abstract: Polyimide nanofoamed films have been prepared from the polyimide precursors (PMDA-ODA) and poly(ethylene oxide)(PEO) in N,N-dimethylacetamide. The dielectric properties of the films were studied over the temperature range of -150-150 °C and a frequency range of 1 Hz-10 MHz. The frequency dependence of the dielectric constant for nanofoamed films with different amounts of PEO was studied. An relaxation process at below the glass transition temperature of the polyimide nanofoamed films was found. The peak value of the dielectric loss increased with increasing amount of PEO.
Rights: © 2008 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Y. Zhang et al. Appl. Phys. Lett. 92, 052910 (2008) and may be found at
Type: Journal/Magazine Article
ISSN: 0003-6951
Appears in Collections:MRC Journal/Magazine Articles
AP Journal/Magazine Articles

Files in This Item:
File Description SizeFormat 
low_dielectric_08.pdf463.59 kBAdobe PDFView/Open

All items in the PolyU Institutional Repository are protected by copyright, with all rights reserved, unless otherwise indicated. No item in the PolyU IR may be reproduced for commercial or resale purposes.