Please use this identifier to cite or link to this item:
Title: Study of interfacial reaction and its impact on electric properties of Hf-Al-O high-k gate dielectric thin films grown on Si
Authors: Lee, P. F.
Dai, Jiyan
Wong, Kin-hung
Chan, Helen L. W.
Choy, Chung-loong
Subjects: Dielectric thin films
Pulsed laser deposition,
MOS capacitors
Hafnium compounds
Aluminium compounds
Transmission electron
Issue Date: 14-Apr-2003
Publisher: American Institute of Physics
Source: Applied physics letters, 14 Apr. 2003, v. 82, no. 15, p.2419-2421
Abstract: Amorphous thin films of Hf-Al-O (with atomic ratio of Al/Hf of about 1.4) were deposited on (100) p-Si substrates by pulsed-laser deposition using a HfO₂ and Al₂O₃ composite target. Transmission electron microscopy was employed for a detailed study of the interfacial reaction between the Hf-Al-O films and the Si substrates. Islands of Hf silicide formed from interfacial reaction were observed on the surface of the Si substrate. The formation of Hf silicide is attributed to the presence of Al oxide in the films that triggers the reaction between Hf atoms in the amorphous Hf-Al-O films and Si under an oxygen deficient condition. The impact of silicide formation on the electrical properties was revealed by high-frequency capacitance-voltage (C-V) measurements on metal-oxide-semiconductor capacitors. The observed abnormal C-V curve due to interfacial reaction was discussed.
Rights: © 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in P. F. Lee et al. Appl. Phys. Lett. 82, 2419 (2003) and may be found at
Type: Journal/Magazine Article
ISSN: 0003-6951
Appears in Collections:AP Journal/Magazine Articles

Files in This Item:
File Description SizeFormat 
interfacial_reaction_03.pdf226.35 kBAdobe PDFView/Open

All items in the PolyU Institutional Repository are protected by copyright, with all rights reserved, unless otherwise indicated. No item in the PolyU IR may be reproduced for commercial or resale purposes.