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|Title: ||Study of interfacial reaction and its impact on electric properties of Hf-Al-O high-k gate dielectric thin films grown on Si|
|Authors: ||Lee, P. F.|
Chan, Helen L. W.
|Subjects: ||Dielectric thin films|
Pulsed laser deposition,
|Issue Date: ||14-Apr-2003 |
|Publisher: ||American Institute of Physics|
|Citation: ||Applied physics letters, 14 Apr. 2003, v. 82, no. 15, p.2419-2421|
|Abstract: ||Amorphous thin films of Hf-Al-O (with atomic ratio of Al/Hf of about 1.4) were deposited on (100) p-Si substrates by pulsed-laser deposition using a HfO₂ and Al₂O₃ composite target. Transmission electron microscopy was employed for a detailed study of the interfacial reaction
between the Hf-Al-O films and the Si substrates. Islands of Hf silicide formed from interfacial reaction were observed on the surface of the Si substrate. The formation of Hf silicide is attributed
to the presence of Al oxide in the films that triggers the reaction between Hf atoms in the amorphous Hf-Al-O films and Si under an oxygen deficient condition. The impact of silicide formation on the electrical properties was revealed by high-frequency capacitance-voltage (C-V) measurements on
metal-oxide-semiconductor capacitors. The observed abnormal C-V curve due to interfacial reaction was discussed.|
|Rights: ||© 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in P. F. Lee et al. Appl. Phys. Lett. 82, 2419 (2003) and may be found at http://link.aip.org/link/?apl/82/2419|
|Type: ||Journal/Magazine Article|
|Appears in Collections:||AP Journal/Magazine Articles|
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