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http://hdl.handle.net/10397/4221
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| Title: | Simulation of thickness effect in thin ferroelectric films using Landau-Khalatnikov theory |
| Authors: | Lo, Veng-cheong |
| Subjects: | Ferroelectric thin films Dielectric hysteresis Dielectric polarisation |
| Issue Date: | 1-Sep-2003 |
| Publisher: | American Institute of Physics |
| Citation: | Journal of applied physics, 1 Sep. 2003, v. 94, no. 5, p. 3353-3359. |
| Abstract: | The thickness effect in ferroelectric thin films has been theoretically investigated using the Landau–Khalatnikov theory. Ferroelectric properties such as the hysteresis loop, and its associated coercive
field and the remanent polarization of various film thicknesses have been numerically simulated. In this simulation, the thin film was modeled by the stacking of layers, each of which has unique parameters for the Landau free energy. Due to the interfacial effects near the electrodes, the
parameters for the surface layers are different from those for the bulk. The simulated result shows that the coercive field decreases while the remanent polarization increases with thickness. Both of these trends qualitatively agree with experiments. |
| Description: | DOI: 10.1063/1.1598275 |
| Rights: | © 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in V. C. Lo, J. Appl. Phys. 94, 3353 (2003) and may be found at http://link.aip.org/link/?jap/94/3353. |
| Type: | Journal/Magazine Article |
| URI: | http://hdl.handle.net/10397/4221 |
| ISSN: | 0021-8979 (print) 1089-7550 (online) |
| Appears in Collections: | AP Journal/Magazine Articles
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