Please use this identifier to cite or link to this item:
Title: Effects of substrate on the dielectric and tunable properties of epitaxial SrTiO₃thin films
Authors: Hao, J. H.
Luo, Zhi
Gao, J.
Subjects: Strontium compounds
Dielectric thin films
Epitaxial layers
Internal stresses
Dielectric losses
Issue Date: 1-Dec-2006
Publisher: American Institute of Physics
Source: Journal of applied physics, 1 Dec. 2006, v. 100, no. 11, 114107, p. 1-5.
Abstract: Tunable dielectric thin films of SrTiO₃(STO) were prepared on different single-crystalline substrates, including insulating LaAlO₃, conductive Nb-doped STO (NSTO), and superconducting YBa₂Cu₃O₇₋δ. Substrate effects including morphology, orientation, and lattice mismatch induced strains were investigated. We found that a change of substrate used for STO thin films can strongly affect the dielectric properties of STO thin films in terms of dielectric constant, loss tangent, and tunability. Effects of substrate properties on the temperature dependence of dielectric constant and loss tangent were investigated. At low temperatures, STO thin films under minimal strain yield high dielectric constant and low loss tangent while the thin films under either tensile or compressive strain exhibit the reduced dielectric constant and high loss. The tunability of about 77% in STO/NSTO system, close to the value found in STO single crystal, was observed at 10 K. Physical origin of observed phenomena was discussed.
Rights: © 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in J. H. Hao, Z. Luo & J. Gao, J. Appl. Phys. 100, 114017 (2006) and may be found at
Type: Journal/Magazine Article
DOI: 10.1063/1.2392746
ISSN: 0021-8979 (print)
1089-7550 (online)
Appears in Collections:AP Journal/Magazine Articles

Files in This Item:
File Description SizeFormat 
Hao_Effects_substrate_dielectric.pdf144.04 kBAdobe PDFView/Open

All items in the PolyU Institutional Repository are protected by copyright, with all rights reserved, unless otherwise indicated. No item in the PolyU IR may be reproduced for commercial or resale purposes.