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Title: Effects of postdeposition annealing on the dielectric properties of antiferroelectric lanthanum-doped lead zirconate stannate titanate thin films derived from pulsed laser deposition
Authors: Yao, Yingbang
Lu, S. G.
Chen, Haydn
Wong, Kin-hung
Subjects: Lead compounds
Lanthanum compounds
Antiferromagnetic materials
Ferroelectric thin films
Pulsed laser deposition
Dielectric hysteresis
Dielectric polarisation
Leakage currents
Dielectric losses
Surface morphology
Issue Date: 15-Nov-2004
Publisher: American Institute of Physics
Source: Journal of applied physics, 15 Nov. 2004, v. 96, no. 10, p. 5830-5835.
Abstract: Lanthanum-doped lead zirconate stannate titanate antiferroelectric thin films were deposited onto Pt-buffered silicon substrates using the pulsed laser deposition method. The deposition temperature was 570 °C. The postdeposition annealing process was carried out in an oxygen-flow tube furnace at temperatures ranging from 650 to 800 °C for a duration of 30 min; its effects were studied through the variations of the microstructure as well as the electrical and dielectric properties. It was found that an appropriate annealing process at temperatures above 700 °C could substantially improve the dielectric properties. However, annealing beyond 800 °C caused the film properties to deteriorate severely. Explanations were given with regard to the microstructure-property relationship.
Rights: © 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Y. Yao et al., J. Appl. Phys. 96, 5830 (2004) and may be found at
Type: Journal/Magazine Article
DOI: 10.1063/1.1804226
ISSN: 0021-8979 (print)
1089-7550 (online)
Appears in Collections:AP Journal/Magazine Articles

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