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|Title: ||Annealing effects on the loss and birefringence of silicon oxynitride rectangular optical waveguides|
|Authors: ||Zhang, Ailing|
Chan, Kam Tai
Chan, Victor W. C.
Chan, Philip C. H.
Chan, Andy H. P.
|Subjects: ||Silicon compounds|
|Issue Date: ||29-Aug-2005 |
|Publisher: ||American Institute of Physics|
|Citation: ||Applied physics letters, 2005, v. 87, 101105, p. 1-3.|
|Abstract: ||Silicon oxynitride rectangular optical waveguides have been fabricated by plasma-enhanced chemical vapor deposition and dry etching. The propagation loss and polarization dependent loss in as-grown samples show a substantial reduction after the samples have been annealed. Birefringence measurements before and after annealing on waveguides of different widths suggest that the waveguide modal birefringence is strongly affected by both waveguide geometry and stress in the material. Hence, the modal birefringence can be minimized by designing the appropriate waveguide geometry to compensate for any stress effects.|
|Rights: ||© 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Zhang A. et al. Appl. Phys. Lett. 87, 101105 (2005) and may be found at http://link.aip.org/link/?apl/87/101105.|
|Type: ||Journal/Magazine Article|
|Appears in Collections:||EE Journal/Magazine Articles|
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