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Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/330

Title: Annealing effects on the loss and birefringence of silicon oxynitride rectangular optical waveguides
Authors: Zhang, Ailing
Chan, Kam Tai
Demokan, Suleyman
Chan, Victor W. C.
Chan, Philip C. H.
Chan, Andy H. P.
Subjects: Silicon compounds
Optical waveguides
Plasma CVD
Etching
Birefringence
Annealing
Stress effects
Issue Date: 29-Aug-2005
Publisher: American Institute of Physics
Citation: Applied physics letters, 2005, v. 87, 101105, p. 1-3.
Abstract: Silicon oxynitride rectangular optical waveguides have been fabricated by plasma-enhanced chemical vapor deposition and dry etching. The propagation loss and polarization dependent loss in as-grown samples show a substantial reduction after the samples have been annealed. Birefringence measurements before and after annealing on waveguides of different widths suggest that the waveguide modal birefringence is strongly affected by both waveguide geometry and stress in the material. Hence, the modal birefringence can be minimized by designing the appropriate waveguide geometry to compensate for any stress effects.
Rights: © 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Zhang A. et al. Appl. Phys. Lett. 87, 101105 (2005) and may be found at http://link.aip.org/link/?apl/87/101105.
Type: Journal/Magazine Article
URI: http://hdl.handle.net/10397/330
ISSN: 00036951
Appears in Collections:EE Journal/Magazine Articles

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