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|Title:||Method for asymmetric hydrosilylation of ketones|
|Authors:||Chan, Albert Sun-chi|
|Source:||US Patent 7,718,831 B2. Washington, DC: US Patent and Trademark Office, 2010.|
|Abstract:||Method of asymmetrically hydrosilylating substrates using catalysts having a ligand of the compound of the formula [refer to Patent file] (I) wherein R is optionally substituted alkyl, cycloalkyl, aryl or heteroaryl; R' is hydrogen, optionally substituted lower alkyl; and R'' is hydrogen, halogen, optionally substituted alkyl, hydroxy, amino (e.g., primary, secondary or tertiary), alkenyl; or an enantiomer thereof; or an enantiomeric mixture thereof with a transition metal. Particularly suitable reactions include the asymmetric hydrosilylation of ketones.|
|Rights:||Assignee: The Hong Kong Polytechnic University.|
|Appears in Collections:||Patents of PolyU|
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