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|Title:||System for analysis of fabric surface|
|Subjects:||Fabric surface analyzing system|
|Source:||US Patent 6,728,593 B2. Washington, DC: US Patent and Trademark Office, 2004.|
|Abstract:||A system for analyzing fabric surface appearance includes a feed mechanism for running a fabric over a crest including a frame for holding the fabric bent to form a crest, an image capturing device for capturing profile images of the fabric surface at the crest, and a computer system for manipulating the images. The computer system produces a three-dimensional representation of the fabric surface and identifies characteristics in the three-dimensional representation. The information is compared to reference data to identify a grade for the fabric.|
|Rights:||Assignee: The Hong Kong Polytechnic University.|
|Appears in Collections:||Patents of PolyU|
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