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Title: System for analysis of fabric surface
Authors: Hu, Jinlian
Xin, Binjie
Guo, Yueyang
Newton, Edward
Subjects: Fabric surface analyzing system
Issue Date: 27-Apr-2004
Source: US Patent 6,728,593 B2. Washington, DC: US Patent and Trademark Office, 2004.
Abstract: A system for analyzing fabric surface appearance includes a feed mechanism for running a fabric over a crest including a frame for holding the fabric bent to form a crest, an image capturing device for capturing profile images of the fabric surface at the crest, and a computer system for manipulating the images. The computer system produces a three-dimensional representation of the fabric surface and identifies characteristics in the three-dimensional representation. The information is compared to reference data to identify a grade for the fabric.
Rights: Assignee: The Hong Kong Polytechnic University.
Type: Patent
Appears in Collections:Patents of PolyU
ITC Patents

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