|
PolyU Institutional Repository >
Browsing by Subject "Semiconductor-insulator boundaries"
Showing results 1 to 3 of 3
| Issue Date | Title | Author(s) | | 1-May-2006 | Comparison of interfacial and electrical characteristics of HfO₂and HfAlO high-k dielectrics on compressively strained Si[sub 1−x]Ge[sub x] | Curreem, K. K. S.; Lee, Pui-fai; Wong, K. S.; Dai, Jiyan; Zhou, M. J.; Wang, J.; Li, Quan |
| 15-Jul-2003 | Epitaxial growth of yttrium-stabilized HfO₂ high-k gate dielectric thin films on Si | Dai, Jiyan; Lee, P. F.; Wong, Kin-hung; Chan, Helen L. W.; Choy, Chung-loong |
| 15-Mar-2003 | Growth and characterization of Hf-aluminate high-k gate dielectric ultrathin films with equivalent oxide thickness less than 10 Å | Lee, P. F.; Dai, Jiyan; Wong, Kin-hung; Chan, Helen L. W.; Choy, Chung-loong |
Showing results 1 to 3 of 3
|
