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Browsing by Subject "Semiconductor-insulator boundaries"

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Issue DateTitleAuthor(s)
1-May-2006 Comparison of interfacial and electrical characteristics of HfO₂and HfAlO high-k dielectrics on compressively strained Si[sub 1−x]Ge[sub x]Curreem, K. K. S.; Lee, Pui-fai; Wong, K. S.; Dai, Jiyan; Zhou, M. J.; Wang, J.; Li, Quan
15-Jul-2003 Epitaxial growth of yttrium-stabilized HfO₂ high-k gate dielectric thin films on SiDai, Jiyan; Lee, P. F.; Wong, Kin-hung; Chan, Helen L. W.; Choy, Chung-loong
15-Mar-2003 Growth and characterization of Hf-aluminate high-k gate dielectric ultrathin films with equivalent oxide thickness less than 10 ÅLee, P. F.; Dai, Jiyan; Wong, Kin-hung; Chan, Helen L. W.; Choy, Chung-loong
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