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Browsing by Subject "Hafnium compounds"

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Showing results 1 to 8 of 8
Issue DateTitleAuthor(s)
1-May-2006 Comparison of interfacial and electrical characteristics of HfO₂and HfAlO high-k dielectrics on compressively strained Si[sub 1−x]Ge[sub x]Curreem, K. K. S.; Lee, Pui-fai; Wong, K. S.; Dai, Jiyan; Zhou, M. J.; Wang, J.; Li, Quan
1-Jan-2007 Effect of Al addition on the microstructure and electronic structure of HfO₂filmWang, X. F.; Li, Quan; Egerton, R. F.; Lee, Pui-fai; Dai, Jiyan; Hou, Z. F.; Gong, X. G.
1-May-2006 Effects of Al addition on the native defects in hafniaLi, Quan; Koo, K. M.; Lau, W. M.; Lee, Pui-fai; Dai, Jiyan; Hou, Z. F.; Gong, X. G.
15-Jul-2003 Epitaxial growth of yttrium-stabilized HfO₂ high-k gate dielectric thin films on SiDai, Jiyan; Lee, P. F.; Wong, Kin-hung; Chan, Helen L. W.; Choy, Chung-loong
15-Mar-2003 Growth and characterization of Hf-aluminate high-k gate dielectric ultrathin films with equivalent oxide thickness less than 10 ÅLee, P. F.; Dai, Jiyan; Wong, Kin-hung; Chan, Helen L. W.; Choy, Chung-loong
14-Mar-2005 Investigation of Ge nanocrytals in a metal-insulator-semiconductor structure with a HfO₂/SiO₂stack as the tunnel dielectricWang, Shiye; Liu, W. L.; Wan, Qing; Dai, Jiyan; Lee, Pui-fai; Luo, Suhua; Shen, Qinwo; Zhang, Miao; Song, Z. T.; Lin, Chenglu
13-Mar-2006 Memory effects of carbon nanotubes as charge storage nodes for floating gate memory applicationsLu, X. B.; Dai, Jiyan
14-Apr-2003 Study of interfacial reaction and its impact on electric properties of Hf-Al-O high-k gate dielectric thin films grown on SiLee, P. F.; Dai, Jiyan; Wong, Kin-hung; Chan, Helen L. W.; Choy, Chung-loong
Showing results 1 to 8 of 8

 

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